05 September 2019
Visiongain has launched a new ICT report High-K and ALD/CVD Metal Precursors Market Report : Forecasts by Technology (Interconnect, Capacitors, Gates), by Application (Semiconductor, Non-semiconductor), by Precursor Type (ALD, CVD) PLUS Profiles of Leading Companies and Regional and Leading National Market Analysis.
The global high-K and ALD/CVD metal precursor market is expected to grow at a steady rate during the forecast period. Precursors are used to forming a thin film of metal oxides, metal nitrides and other kinds of chemical compounds. Material formation based on CVD and ALD relies heavily on the use of right precursor Metal Precursors are primarily used in semiconductor thin film research development applications. For instance, end-user use insulators with a high dielectric constant in modern semiconductor devices. Based on primarily use, they are classified into ALD (Atomic Layer Deposition) and CVD ( Chemical Vapor Deposition) precursors. Metal precursor has considerably migrated from metal hydrides and halides to an array of metal-organic compounds such as metal alkoxides, metal alkyls, metal diketonites, metal amindinates, metal carbonyls among others.
Global high-K and ALD/CVD metal precursor market is primarily driven by an increase in the number of R&D activities. New Industrial applications are using ALD technology which uses metal precursors to accelerate the demand for deposition of first-row metal films. An increase in the number of applications in non-semiconductor areas and rapid in the semiconductor industry is expected to drive the growth in the global high-K and ALD/CVD metal precursor market. By technology, capacitors sub-segment is projected to expand with the highest CAGR with Interconnect sub-segment accounting for the largest market share in 2019. By Precursor Type, ALD will create significant revenue opportunity over Non-ALD precursors and is most attractive sub-segment based on CAGR. Based on region, North America holds the largest market share in the global high-K and ALD/CVD metal precursor market 2019 and is projected to lose its market share to the Asia Pacific region by 2029.
Some of the other companies operating in the market include Air Liquide, Adeka Corporation, SAFC Hitech Ltd. (Merck KGaA). AG Semiconductor Services Inc., Air Products and Chemicals, Inc., Colnatec, Dow Chemical, Dynamic Network Factory Inc., JSR Corporation, Linde, NANMAT, Praxair, Samsung Electronics, Strem Chemicals Inc., Tri Chemical Laboratories Inc., and Union Pacific Chemicals. These companies are taking various strategic initiatives such as mergers, acquisitions and collaborations so as to increase their presence in the global market.
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