Industries > Electronics > High-K and ALD/CVD Metal Precursors Market Report 2019-2029

High-K and ALD/CVD Metal Precursors Market Report 2019-2029

Forecasts by Technology (Interconnect, Capacitors, Gates), by Application (Semiconductor, Non-semiconductor), by Precursor Type (ALD, CVD) PLUS Profiles of Leading Companies and Regional and Leading National Market Analysis

PUBLISHED: 19 August 2019
PAGES: 166
PRODUCT CODE: ELE00032
SUBMARKET: Devices

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Global high-K and ALD/CVD metal precursor market is primarily driven by an increase in the number of R&D activities. New Industrial applications are using ALD technology which uses metal precursors to accelerate the demand for deposition of first-row metal films. An increase in the number of applications in non-semiconductor areas and rapid in the semiconductor industry is expected to drive the growth in the global high-K and ALD/CVD metal precursor market. By technology, capacitors sub-segment is projected to expand with the highest CAGR with Interconnect sub-segment accounting for the largest market share in 2019. By Precursor Type, ALD will create significant revenue opportunity over Non-ALD precursors and is most attractive sub-segment based on CAGR. Based on region, North America holds the largest market share in the global high-K and ALD/CVD metal precursor market 2019 and is projected to lose its market share to the Asia Pacific region by 2029.

Some of the other companies operating in the market include Air Liquide, Adeka Corporation, SAFC Hitech Ltd. (Merck KGaA). AG Semiconductor Services Inc., Air Products and Chemicals, Inc., Colnatec, Dow Chemical, Dynamic Network Factory Inc., JSR Corporation, Linde, NANMAT, Praxair, Samsung Electronics, Strem Chemicals Inc., Tri Chemical Laboratories Inc., and Union Pacific Chemicals. These companies are taking various strategic initiatives such as mergers, acquisitions and collaborations so as to increase their presence in the global market

The High-k and ALD/CVD Metal Precursors Market Forecast 2019-2029 responds to your need for definitive market data

Read on to discover how you can exploit the future business opportunities emerging in this sector. Visiongain’s new study tells you and tells you NOW.

The 293 page report provides clear, detailed insight into the global High-k and ALD/CVD Metal Precursors market. Discover the key drivers and challenges affecting the market.

Also in this report are project tables covering over 50 leading current and future projects by Technology, Application, and Precursor Type.

By ordering and reading our brand-new report today, you stay better informed and ready to act.

Report Scope

The report delivers considerable added value by revealing:

• 249 tables, charts and graphs are analysing and revealing the growth prospects and outlook for the High-k and ALD/CVD Metal Precursors market.

• Global High-k and ALD/CVD Metal Precursors market forecasts and analysis from 2019-2029.

• High-k and ALD/CVD Metal Precursors market provides CAPEX and CAPACITY forecasts and analysis from 2019-2029 for three submarkets:

High-k and ALD/CVD Metal Precursors Market Forecasts and Analysis from 2019-2029 by Application
• Semiconductor Forecast 2019-2029
• Non-Semiconductor Forecast 2019-2029
High-k and ALD/CVD Metal Precursors Market Forecasts and Analysis from 2019-2029 by Technology
• Interconnect Forecast 2019-2029
• Capacitors Forecast 2019-2029
• Gates Forecast 2019-2029
High-k and ALD/CVD Metal Precursors Market Forecasts and Analysis from 2019-2029 by Precursor Type
• ALD (Atomic layer Deposition) Forecast 2019-2029
• CVD (Chemical vapour Deposition) Forecast 2019-2029

Regional High-k and ALD/CVD Metal Precursors market forecasts from 2019-2029 with drivers and restraints for the countries including:
– Canada
– U.S.
– Brazil
– U.K.
– Norway
– Germany
– France
– Spain
– Italy
– EU7
– Vietnam
– China
– Australia
– Malaysia
– Indonesia
– India
– Angola
– Nigeria
– Iran
– Mexico
– Ghana

Regional market shares in the High-k and ALD/CVD Metal Precursors market 2019

• Company profiles for the leading High-k and ALD/CVD Metal Precursors companies
– Air Liquide
– Adeka Corporation
– SAFC Hitech Ltd. (Merck KGaA)
– AG Semiconductor Services Inc.
– Air Products and Chemicals, Inc.
– Colnatec
– Dow Chemical
– Dynamic Network Factory Inc.
– JSR Corporation
– Linde
– NANMAT
– Praxair
– Samsung Electronics
– Strem Chemicals Inc.
– Tri Chemical Laboratories Inc.
– Union Pacific Chemicals

Conclusions and recommendations which will aid decision-making

How will you benefit from this report?
• Keep your knowledge base up to speed. Don’t get left behind
• Reinforce your strategic decision-making with definitive and reliable market data
• Learn how to exploit new technological trends
• Realise your company’s full potential within the market
• Understand the competitive landscape and identify potential new business opportunities & partnerships

Who should read this report?
• Anyone with involvement in the High-k and ALD/CVD Metal Precursors
• High-k and ALD/CVD Metal Precursors market analysts
• High-k and ALD/CVD Metal Precursors investors
• Business, marketing
• Competitive intelligence manager
• Director
• Strategic marketing
• Business intelligence
• Competitive intelligence analyst
• Consultant
• Marketing manager
• Marketing executive
• Marketing consultant
• Business development manager
• Strategy director
• Strategic affairs
• Strategic development
• Business Technologies manager

Visiongain’s study is intended for anyone requiring commercial analyses for the High-k and ALD/CVD Metal Precursors market and leading companies. You find data, trends and predictions.

Buy our report today the High-k and ALD/CVD Metal Precursors Market Analysis Avoid missing out by staying informed – get our report now.

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CCR Ref number: KD4R6

Do you have any custom requirements we can help you with? Any need for specific country, geo region, market segment or specific company information? Contact us today, we can discuss your needs and see how we can help sara.peerun@visiongain.com

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